Description
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.Configuration
0.35 0.63 5:1 22*22 FIA:80 LSA:60OEM Model Description
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.Documents
No documents
Verified
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131657
Wafer Sizes:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-2205i11D
CATEGORY
Steppers & Scanners
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
131657
Wafer Sizes:
2"/50mm, 4"/100mm, 6"/150mm, 8"/200mm, 12"/300mm
Vintage:
Unknown
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
NIKON I-line lithography machine Nikon I-line lithography machine uses a light source with a wavelength of 365nm and is a key device for fine pattern transfer in semiconductor manufacturing. The main models include the NSR series (step-and-projection type) and the 3 series (scanning type). They support a variety of wafer sizes and are widely used in the production of 2-inch, 4-inch, 6-inch, 8-inch and 12-inch wafers. This allows them to serve semiconductor production lines of different sizes and meet diverse production needs.Configuration
0.35 0.63 5:1 22*22 FIA:80 LSA:60OEM Model Description
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.Documents
No documents