Description
No descriptionConfiguration
2 Chamber System (Wsix CVD ) Hardware Configuration: - 3-Chamber(L/R/C) System - DCS-Wsix process specification(HT) - Dry pump for both loadlock Module - 2-Loadlock , 2-Cassette Module - Turbo pump and dry pump for transfer and process chambers - Display with touch panel at clean room side. - Monitor with keyboard and mouse at maintenance area - Gas line config - one line splitting to two chambers - 2 MKS baratron for process chamber (5Torr and 50mTorr) - Gas WF6 5sccm , DCS 500sccm , Ar 200sccm (2Ea) , - Ar(backside Ar) 100sccm , ClF3 500sccm - AC208V / 150Hz / 3-PHASE / 100kVA breaker - Water Pressure 5 kgfcm2 max - Water Flow 33 litre/min - Water Temperature 15 - 25 degC - General Exhaust Volume 3.2 m3/min - TEL Secondary breaker box 1Ea - BOC DE150 GRC Scrubber - Mainframe of Software Version : V4-8gLOEM Model Description
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.Documents
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TEL / TOKYO ELECTRON
MB2-730
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
41303
Wafer Sizes:
8"/200mm
Vintage:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MB2-730
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
41303
Wafer Sizes:
8"/200mm
Vintage:
1997
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
2 Chamber System (Wsix CVD ) Hardware Configuration: - 3-Chamber(L/R/C) System - DCS-Wsix process specification(HT) - Dry pump for both loadlock Module - 2-Loadlock , 2-Cassette Module - Turbo pump and dry pump for transfer and process chambers - Display with touch panel at clean room side. - Monitor with keyboard and mouse at maintenance area - Gas line config - one line splitting to two chambers - 2 MKS baratron for process chamber (5Torr and 50mTorr) - Gas WF6 5sccm , DCS 500sccm , Ar 200sccm (2Ea) , - Ar(backside Ar) 100sccm , ClF3 500sccm - AC208V / 150Hz / 3-PHASE / 100kVA breaker - Water Pressure 5 kgfcm2 max - Water Flow 33 litre/min - Water Temperature 15 - 25 degC - General Exhaust Volume 3.2 m3/min - TEL Secondary breaker box 1Ea - BOC DE150 GRC Scrubber - Mainframe of Software Version : V4-8gLOEM Model Description
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.Documents
No documents