Description
Gas used N2 Ar WF6 CIF3 DCS 190-220VAC 50/60HzConfiguration
No ConfigurationOEM Model Description
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.Documents
No documents
TEL / TOKYO ELECTRON
MB2-730
Verified
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
70816
Wafer Sizes:
Unknown
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
MB2-730
CATEGORY
Dry / Plasma Etch
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
70816
Wafer Sizes:
Unknown
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Gas used N2 Ar WF6 CIF3 DCS 190-220VAC 50/60HzConfiguration
No ConfigurationOEM Model Description
The MB2-730 is a highly reliable system designed for advanced process capability in tungsten and tungsten silicide CVD applications. It has been in production for 5 years and has proven to be a dominant tool in the CVD tungsten silicide market, with a market share of over 70%. This system is known for its reliability and advanced process capabilities, making it a popular choice for those in the industry.Documents
No documents