Description

No description

Configuration

Thickness Measurement

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.

Documents

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ONTO / RUDOLPH / AUGUST

FOCUS FE VII

Verified

Elipsometry

Last Verified: 19 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

103869

Wafer Sizes:

8"/200mm

Vintage:

2002

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listing-photo-c779630ed75e4bc59dc1ff0ec85f5ee5-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

103869

Wafer Sizes:

8"/200mm

Vintage:

2002

Logistics Support

Available

Money Back Guarantee

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

No description

Configuration

Thickness Measurement

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.