Description

Thickness Measurement

Configuration

No Configuration

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.

Documents

No documents

ONTO / RUDOLPH / AUGUST

FOCUS FE VII

Verified

Elipsometry

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

65963

Wafer Sizes:

8"/200mm

Vintage:

2002

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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listing-photo-68122fc9c0a8437b93db59aeaf5c09de-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

65963

Wafer Sizes:

8"/200mm

Vintage:

2002

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

Thickness Measurement

Configuration

No Configuration

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.