Description
Thickness MeasurementConfiguration
No ConfigurationOEM Model Description
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.Documents
No documents
ONTO / RUDOLPH / AUGUST
FOCUS FE VII
Verified
CATEGORY
Elipsometry
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65963
Wafer Sizes:
8"/200mm
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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ONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: 0Condition: Used
Last VerifiedOver 60 days ago
ONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: 0Condition: Used
Last VerifiedOver 60 days ago
ONTO / RUDOLPH / AUGUST
FOCUS FE VII
CATEGORY
Elipsometry
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
65963
Wafer Sizes:
8"/200mm
Vintage:
2002
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Thickness MeasurementConfiguration
No ConfigurationOEM Model Description
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.Documents
No documents