Description

Inspectra

Configuration

No Configuration

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.

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ONTO / RUDOLPH / AUGUST

FOCUS FE VII

Verified

Elipsometry

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

47142

Wafer Sizes:

6"/150mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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listing-photo-b580f83b2adb4cf1b8c3413de07ac055-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png

Key Item Details

Condition:

Used

Operational Status:

Unknown

Product ID:

47142

Wafer Sizes:

6"/150mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

Description

Inspectra

Configuration

No Configuration

OEM Model Description

FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.