FOCUS FE VII
Category
ElipsometryOverview
FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.
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ONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: Condition: UsedLast VerifiedOver 60 days agoONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: Condition: UsedLast VerifiedOver 60 days agoONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: 2002Condition: UsedLast VerifiedOver 60 days agoONTO / RUDOLPH / AUGUST
FOCUS FE VII
ElipsometryVintage: Condition: UsedLast VerifiedOver 60 days ago
