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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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ONTO / RUDOLPH / AUGUST FOCUS FE VII
    Description
    Inspectra
    Configuration
    No Configuration
    OEM Model Description
    FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.
    Documents

    No documents

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    verified-listing-icon

    Verified

    CATEGORY
    Elipsometry

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    105771


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    ONTO / RUDOLPH / AUGUST FOCUS FE VII

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    Elipsometry
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    verified-listing-icon
    Verified
    CATEGORY
    Elipsometry
    Last Verified: Over 60 days ago
    listing-photo-1d5e25f4f18c4b7dbfb05e872f70a6a9-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    105771


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Inspectra
    Configuration
    No Configuration
    OEM Model Description
    FOCUS FE VII system is designed for high volume, sub-micron device manufacturing requiring superior film thickness and index of refraction measurements in diffusion, etch, CMP and CVD applications.
    Documents

    No documents

    Similar Listings
    View All
    ONTO / RUDOLPH / AUGUST FOCUS FE VII

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    ElipsometryVintage: 0Condition: UsedLast Verified:Over 30 days ago
    ONTO / RUDOLPH / AUGUST FOCUS FE VII

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    ElipsometryVintage: 0Condition: UsedLast Verified:Over 60 days ago
    ONTO / RUDOLPH / AUGUST FOCUS FE VII

    ONTO / RUDOLPH / AUGUST

    FOCUS FE VII

    ElipsometryVintage: 2002Condition: UsedLast Verified:Over 60 days ago