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KLA AIT I
    Description
    No description
    Configuration
    Lens Assembly in transport box
    OEM Model Description
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
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    KLA

    AIT I

    verified-listing-icon

    Verified

    CATEGORY
    Defect Inspection

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    56599


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown

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    KLA AIT I

    KLA

    AIT I

    Defect Inspection
    Vintage: 2008Condition: Refurbished
    Last VerifiedOver 60 days ago

    KLA

    AIT I

    verified-listing-icon
    Verified
    CATEGORY
    Defect Inspection
    Last Verified: Over 60 days ago
    listing-photo-e6bb98818f8c4478b767b26751966ce3-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    56599


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Lens Assembly in transport box
    OEM Model Description
    The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
    Documents

    No documents

    Similar Listings
    View All
    KLA AIT I

    KLA

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    Defect InspectionVintage: 2008Condition: RefurbishedLast Verified: Over 60 days ago
    KLA AIT I

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    AIT I

    Defect InspectionVintage: 1996Condition: UsedLast Verified: Over 60 days ago
    KLA AIT I

    KLA

    AIT I

    Defect InspectionVintage: 1997Condition: UsedLast Verified: Over 60 days ago