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KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
  • KLA AIT I
Description
Patterned Surface Inspection System
Configuration
Auto - Model: AIT I Main System - KLA-Tencor AIT I Mainframe - Currently Configured for 6"/150mm & 8"/200mm Wafers - Double Darkfield Inspection Tool - SECS II/GEM Communication Interface - Low Contact Chuck (AIT I) - Multi Channel Collection Optics System with Independent Programmable Spatial Filters - Pentium CPU with Windows NT Installed - Wafer Transfer Area Housing Cover - Wafer Handling Module - High Voltage Electronics - Front and Rear EMO’s with Covers - Flat Panel Display for AIT - Fold Down Keyboard Tray with Built In Mouse - X/Y Drive/Controller Chassis and Motion Controller Card - Blower Box (exhaust hoses not included) - Operations Manual and Documentation
OEM Model Description
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
Documents

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verified-listing-icon

Verified

CATEGORY
Defect Inspection

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

60830


Wafer Sizes:

6"/150mm, 8"/200mm


Vintage:

1997


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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KLA

AIT I

verified-listing-icon
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
listing-photo-1b550ff0d4b649a4b1c15de499e5ed5c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/49849/1b550ff0d4b649a4b1c15de499e5ed5c/4f62775531994c9a8510895e3fd57a4a_89d08eb88537413cb8eec3f1509f51151201a_mw.jpeg
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listing-photo-1b550ff0d4b649a4b1c15de499e5ed5c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/49849/1b550ff0d4b649a4b1c15de499e5ed5c/d72d492b50574ec9b3e7490da0073064_00963b18138849b48231da996a18d9051201a_mw.jpeg
listing-photo-1b550ff0d4b649a4b1c15de499e5ed5c-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/49849/1b550ff0d4b649a4b1c15de499e5ed5c/fb701d50fd0645d4bee09bcf546e9766_a4917f3dd6484f378944b8841299919b1201a_mw.jpeg
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

60830


Wafer Sizes:

6"/150mm, 8"/200mm


Vintage:

1997


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Patterned Surface Inspection System
Configuration
Auto - Model: AIT I Main System - KLA-Tencor AIT I Mainframe - Currently Configured for 6"/150mm & 8"/200mm Wafers - Double Darkfield Inspection Tool - SECS II/GEM Communication Interface - Low Contact Chuck (AIT I) - Multi Channel Collection Optics System with Independent Programmable Spatial Filters - Pentium CPU with Windows NT Installed - Wafer Transfer Area Housing Cover - Wafer Handling Module - High Voltage Electronics - Front and Rear EMO’s with Covers - Flat Panel Display for AIT - Fold Down Keyboard Tray with Built In Mouse - X/Y Drive/Controller Chassis and Motion Controller Card - Blower Box (exhaust hoses not included) - Operations Manual and Documentation
OEM Model Description
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.
Documents

No documents

Similar Listings
View All