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AIT-ETOEM Model Description
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.Documents
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KLA
AIT I
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
127335
Wafer Sizes:
8"/200mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
AIT-ETOEM Model Description
The AIT In-line Defect Inspection System is a high-throughput system that uses proprietary double-darkfield (DDF) laser scanning technology to detect defects, microscratches, and particulate contamination on wafers. It can inspect up to 30 wafers per hour at maximum sensitivity and has a low cost-per-inspection, making it economically feasible to perform in-line process monitoring at more process levels. The system achieves exceptional defect sensitivity through innovations such as a reduced laser spot size and a unique double-darkfield laser scattering design.Documents
No documents