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LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
  • LAM RESEARCH / NOVELLUS INOVA
Description
PVD
Configuration
PVD
OEM Model Description
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.
Documents

No documents

LAM RESEARCH / NOVELLUS

INOVA

verified-listing-icon

Verified

CATEGORY
CVD

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

17285


Wafer Sizes:

8"/200mm


Vintage:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
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LAM RESEARCH / NOVELLUS

INOVA

verified-listing-icon
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
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Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

17285


Wafer Sizes:

8"/200mm


Vintage:

1999


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
PVD
Configuration
PVD
OEM Model Description
The INOVA system, which is in the final stages of its development, is an advanced PVD system that delivers Maxfill aluminum and superior Ti/Ti-nitride film quality with excellent particle performance. Maxfill is an innovative, low-pressure, low-k compatible process for aluminum via fill. The Ti/TiN process is in production with Controlled Divergence Technology (CDS). The INOVA is a multi-chamber single wafer processing system. INOVA(TM) Tantalum films are designed to enable barriers for copper metallization.
Documents

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