Description
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WJ-999 CVDOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
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AVIZA / WATKINS-JOHNSON
WJ-999
Verified
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled / Uncrated
Product ID:
102980
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
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AVIZA / WATKINS-JOHNSON
WJ-999
CATEGORY
CVD
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Deinstalled / Uncrated
Product ID:
102980
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
WJ-999 CVDOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
No documents