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WATKINS JOHNSON WJ999C Operating surface does not have the aluminum frameOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
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AVIZA / WATKINS-JOHNSON
WJ-999
Verified
CATEGORY
CVD
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
114729
Wafer Sizes:
Unknown
Vintage:
Unknown
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AVIZA / WATKINS-JOHNSON
WJ-999
CATEGORY
CVD
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
114729
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
WATKINS JOHNSON WJ999C Operating surface does not have the aluminum frameOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
No documents