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6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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AVIZA / WATKINS-JOHNSON WJ-999
    Description
    No description
    Configuration
    Bulk list of parts for WJ999 LIST ATTACHED
    OEM Model Description
    The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.
    Documents

    AVIZA / WATKINS-JOHNSON

    WJ-999

    verified-listing-icon

    Verified

    CATEGORY
    CVD

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    82675


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
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    AVIZA / WATKINS-JOHNSON WJ-999

    AVIZA / WATKINS-JOHNSON

    WJ-999

    CVD
    Vintage: 0Condition: Used
    Last VerifiedOver 30 days ago

    AVIZA / WATKINS-JOHNSON

    WJ-999

    verified-listing-icon
    Verified
    CATEGORY
    CVD
    Last Verified: Over 60 days ago
    listing-photo-b7d036fd890c45da9d9b662dcae6090a-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Parts Tool


    Operational Status:

    Unknown


    Product ID:

    82675


    Wafer Sizes:

    Unknown


    Vintage:

    Unknown


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    Bulk list of parts for WJ999 LIST ATTACHED
    OEM Model Description
    The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.
    Documents
    Similar Listings
    View All
    AVIZA / WATKINS-JOHNSON WJ-999

    AVIZA / WATKINS-JOHNSON

    WJ-999

    CVDVintage: 0Condition: UsedLast Verified:Over 30 days ago
    AVIZA / WATKINS-JOHNSON WJ-999

    AVIZA / WATKINS-JOHNSON

    WJ-999

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago
    AVIZA / WATKINS-JOHNSON WJ-999

    AVIZA / WATKINS-JOHNSON

    WJ-999

    CVDVintage: 0Condition: UsedLast Verified:Over 60 days ago