WJ-999
Category
CVDOverview
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.
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AVIZA / WATKINS-JOHNSON
WJ-999
CVDVintage: Condition: UsedLast VerifiedOver 30 days agoAVIZA / WATKINS-JOHNSON
WJ-999
CVDVintage: Condition: UsedLast VerifiedOver 60 days agoAVIZA / WATKINS-JOHNSON
WJ-999
CVDVintage: Condition: UsedLast VerifiedOver 60 days agoAVIZA / WATKINS-JOHNSON
WJ-999
CVDVintage: Condition: UsedLast VerifiedOver 60 days ago