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Description
No descriptionConfiguration
Process: TEOS Wafer size: Set up for 6” (double wide). Can do 4”, 5” (double wide), also 8” after carrier modification TEOS process: TEOS, TMPi, TMB MB Wafer cassette slots: 25 slots, 2 load- and 2 unload stations and overflow Temperature / Belt speed range: Up to 550 °C / 0~8 inch / minOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
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Verified
CATEGORY
CVD
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
122830
Wafer Sizes:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
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Money Back Guarantee
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Transaction Insured by Moov
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Refurbishment Services
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AVIZA / WATKINS-JOHNSON
WJ-999
CATEGORY
CVD
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
122830
Wafer Sizes:
4"/100mm, 5"/125mm, 6"/150mm, 8"/200mm
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
Process: TEOS Wafer size: Set up for 6” (double wide). Can do 4”, 5” (double wide), also 8” after carrier modification TEOS process: TEOS, TMPi, TMB MB Wafer cassette slots: 25 slots, 2 load- and 2 unload stations and overflow Temperature / Belt speed range: Up to 550 °C / 0~8 inch / minOEM Model Description
The WJ-999 is a product from Watkins Johnson. It is an Atmospheric Pressure CVD with 3 process chambers for TEOS and hydride processes. It is used for depositing doped or undoped silicon dioxide (SiO2) films, created from either the TEOS/Ozone or Silane/Oxygen CVD reaction.Documents
No documents