Description
No descriptionConfiguration
ACT-12(2C2D) Direction: LEFT HAND SIDE ➢ Utilized with Nikon S204/205 Scanner Exposure Tool ➢ General iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility 3 Blocks Interfaced: Foup-Process Block-Scanner Interface 3 Wafer Transfer Robot Arms: Foup-Process Block-Scanner Interface Control Module on Cassette End-Station (CES) or Foup ➢ Interface Block Single-pincette shared wafer transfer with centering guides Standard wafer arm and interface panel to accommodate stepper/scanner Interface includes a CPL for insuring consistent wafer temps into the stepper/scanner ➢ 2 Coaters (COT) 4 resist nozzles with temperature control 16 layer resist and solvent filters T-100 resist pumps 4L or 1L Nowpak capability ➢ 2 Developers (DEV) 2 “H” nozzles with temperature control per cup 16 layer developer filter Bulk-FSI system for developer ➢ 2 Adhesion Process Stations (ADH) Half sealed chamber with dispersion plate for HMDS ➢ 5 Chill Plate Process Stations with temperature control (CPL) ➢ 1 Transfer Chill Plate (TCP) ➢ 8 Low Temperature Hot Plate Process Stations with temperature control (LHP) ➢ 4 Precision Chilling Hot Plate Process Stations for SB or PEB (PHP) ➢ 1 Wafer Edge Exposure Process Station (WEE) DUV illumination monitor on lamp housing Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern ➢ Subcomponents Fluid Temperature Controller Temperature & Humidity Controller Chemical Cabinet AC Power Box ➢ Note : Exclude HDDOEM Model Description
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.Documents
TEL / TOKYO ELECTRON
ACT 12
Verified
CATEGORY
Coaters & Developers
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103654
Wafer Sizes:
12"/300mm
Vintage:
2001
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Verified
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Coaters & Developers
Last Verified: 5 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
103654
Wafer Sizes:
12"/300mm
Vintage:
2001
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
ACT-12(2C2D) Direction: LEFT HAND SIDE ➢ Utilized with Nikon S204/205 Scanner Exposure Tool ➢ General iUSC SECSI, SECSII, HSMS, & GEM Interface Compatibility 3 Blocks Interfaced: Foup-Process Block-Scanner Interface 3 Wafer Transfer Robot Arms: Foup-Process Block-Scanner Interface Control Module on Cassette End-Station (CES) or Foup ➢ Interface Block Single-pincette shared wafer transfer with centering guides Standard wafer arm and interface panel to accommodate stepper/scanner Interface includes a CPL for insuring consistent wafer temps into the stepper/scanner ➢ 2 Coaters (COT) 4 resist nozzles with temperature control 16 layer resist and solvent filters T-100 resist pumps 4L or 1L Nowpak capability ➢ 2 Developers (DEV) 2 “H” nozzles with temperature control per cup 16 layer developer filter Bulk-FSI system for developer ➢ 2 Adhesion Process Stations (ADH) Half sealed chamber with dispersion plate for HMDS ➢ 5 Chill Plate Process Stations with temperature control (CPL) ➢ 1 Transfer Chill Plate (TCP) ➢ 8 Low Temperature Hot Plate Process Stations with temperature control (LHP) ➢ 4 Precision Chilling Hot Plate Process Stations for SB or PEB (PHP) ➢ 1 Wafer Edge Exposure Process Station (WEE) DUV illumination monitor on lamp housing Uses a 250W ultra pressure Mercury lamp with 5x4mm illumination pattern ➢ Subcomponents Fluid Temperature Controller Temperature & Humidity Controller Chemical Cabinet AC Power Box ➢ Note : Exclude HDDOEM Model Description
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.Documents
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