Description
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2Configuration
PN: MD-E220490/MD-E220494OEM Model Description
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.Documents
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TEL / TOKYO ELECTRON
ACT 12
Verified
CATEGORY
Coaters & Developers
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
114303
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
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TEL / TOKYO ELECTRON
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CATEGORY
Coaters & Developers
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
114303
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
1.Inline: Nikon in-line 2.Pump: RRC 8 One 3.Main Controller：Type3 4.Spin Motor type: Panasonic 5.Chemical supplier: ADH local Solvents/Dev CSS 6.T/H controller：2 tower model：ME2Configuration
PN: MD-E220490/MD-E220494OEM Model Description
The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.Documents
No documents