The CLEAN TRACK™ LITHIUS™ Series is the latest coater/developer equipped with high-technology succeeding from the CLEAN TRACK™ ACT™ series. The key concepts are extensibility to advanced processes, high throughput, reduced footprint, improved OEE (Overall Equipment Efficiency), and CoO (Cost of Ownership) reduction.

Successor to the ACT - 200mm or 300mm, more modules and faster throughput (150 wph).

TEL / TOKYO ELECTRON

LITHIUS

The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It offers improved productivity and scaling, building on the concept of the Mark V, which was released in 1989 as a top-end model. The Mark 7/8 also features advanced environment control technology, enabling stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production.

MARK 7

The CLEAN TRACK™ ACT™ 12 is a 300mm coater/developer that enables stable, high-quality processing and smooth transition from R&D to volume production. It is an in-line model with an exposure tool that has almost the same footprint as the previous track series, but provides higher throughput due to its high-speed transfer system. Uptime has been improved by increasing the reliability of each component and simplifying maintenance. Additionally, the platform supports DUV processing through the use of a ULPA chemical filter and a high precision oven. This makes it a powerful tool for achieving consistent results in both research and production environments.

ACT 12

CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.

ACT 8

The CLEAN TRACK™ Mark 7/8 is an innovative coater developer system designed for 5 to 8 inch wafers. It builds upon the success of the Mark V, which was released in 1989 as a top-end model, by incorporating further scaling and improved productivity. The Mark 7/8 also features advanced environment control technology, which enables stable and excellent performance. This system is versatile and can support various manufacturing scenarios, from research and development to volume production. 

MARK 8

The CLEAN TRACK™ Mark-Vz is a top-selling coater developer system for 4 to 6 inch wafers, developed by TEL. With over one thousand and hundreds of systems shipped worldwide, the Mark-Vz has become an industry standard through continuous quality improvement and upgrading. Even after 30 years since its release, the Mark-Vz is still widely used in various applications and remains active in production today. The system can handle wafer sizes of 75/100/150mm and has a throughput of 60 wph for inline processes. It is compatible with substrates such as Si, GaAs, GaN, GaP, SiC Glass, Sapphire, AlTiC, LN, and LT. Additionally, the Mark-Vz features a transfer robot for added convenience. With its comprehensive range of scale options and valuable knowledge and experience in the market, the Mark-Vz is a reliable choice for coating and developing needs.

MARK-Vz

The CLEAN TRACK™ Mark-V is a 30-year-old coater that has revolutionized the concept of conventional photoresist systems. It has introduced various innovative technologies such as a stacked clean oven module layout and high-speed wafer handling robotics, setting worldwide standards for photoresist systems. The Mark-V is capable of handling 75, 100, and 150mm wafers at a rate of 60 wafers per hour and is an open system. It’s an impressive piece of technology! 

MARK V

CLEAN TRACK™ LITHIUS Pro™ V incorporates all of the advanced technology of the proven CLEAN TRACK™ LITHIUS Pro™ V. It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.

LITHIUS Pro V

The CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through innovative modules and integrated metrology for advanced process control solutions. This platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership). In summary, the CLEAN TRACK™ LITHIUS Pro™/LITHIUS Pro™ ｰi is a highly efficient and cost-effective solution for advanced immersion lithography.

LITHIUS Pro-i

The CLEAN TRACK™ LITHIUS Pro™ is a state-of-the-art 300mm process coater/developer that offers enhanced productivity and a significantly decreased footprint. It supports advanced immersion lithography through its innovative modules and integrated metrology, providing advanced process control solutions. Additionally, this platform improves upon the core track concepts of OEE (Overall Equipment Efficiency) and lower CoO (Cost of Ownership), making it a cost-effective and efficient solution for your lithography needs.

LITHIUS Pro

The CLEAN TRACK™ ACT™ M incorporates three separate high-performance application modules: photomask developer, resist coater, and PEB (Post-Exposure Bake) oven. The system provides sophisticated process control and techniques in the photomask manufacturing process to meet the advanced requirements from industry for OPC(Optical Proximity Correction), phase shifting, and the use of chemical amplification resists. The system extends TEL's long-standing semiconductor and FPD coating and developing technology, and achieves high reliability by adopting CLEAN TRACK™ ACT™ technology.

ACT M

The CLEAN TRACK LITHIUS i+ is a 300-mm/200-mm coater/developer designed for technology nodes 45-nm and beyond. It was developed based on three concepts: improved processing, short cycle times, and enhanced network solutions. The system achieves increased responsiveness and stability for important process technologies, shorter lead and start-up times, and allows for easier modifications. It is designed with a metrology integration block and offers an increased network capability that integrates various advanced network technologies, such as eDiagnostics and APC. The CLEAN TRACK LITHIUS i+ supports a throughput of 150 WPH (wafer per hour) and features a thermally isolated design that minimizes thermal interference. It comes standard with the core network solution “Ingenio,” a data analysis platform, and allows for full system integration of measurement and inspection tools. The CLEAN TRACK LITHIUS i+ is specifically developed for immersion technology and is suitable for lithography processes such as ArF immersion, ArF, KrF, and i-line.

LITHIUS i+

The CLEAN TRACK™ Mark was the first domestic model of coater/developer for TEL which was based on the photoresist system developed and manufactured in US.

MARK

CS 450

The CLEAN TRACK™ Mark-II is a coater/developer system developed by TEL. It is an advanced version of the first domestic model, the CLEAN TRACK™ Mark, which was based on a photoresist system developed and manufactured in the US. The Mark-II was able to transition to larger wafer sizes of up to 6 inches and featured an advanced controller. Through multiple efforts, such as introducing in-line models with exposure tools, the system’s productivity was continuously improved. 

MARK II

It enables higher throughput, increases wafers per day, and improves overall equipment efficiency. Additionally, it also meets industry requirements for versatile lithography equipment capable of leading edge processes, including double patterning.

LITHIUS Pro V-i

The CLEAN TRACK™ LITHIUS Pro™ Z is the most advanced 300mm coater/developer from TEL, designed for the 10nm technology node and beyond. It offers user-friendly operation, flexible configurations for future processes, and automated monitoring technology to support a wide range of applications, from next-generation development to high-volume mass production. Compared to the previous generation LITHIUS Pro™ and Pro V, the LITHIUS Pro™ Z improves performance in three key areas: defectivity, productivity, and CoO (Cost of Ownership). It also offers increased process flexibility to support advanced immersion lithography, including double and multiple patterning schemes as well as EUV processes. This makes it an ideal choice for those looking for a high-performance coater/developer that can meet the demands of the future.

LITHIUS Pro Z

CS 500

CLEAN TRACK LITHIUS i

CLEAN TRACK™ LITHIUS Pro™ AP for 300mm wafer processing system incorporates fundamental concepts from the widely-installed CLEAN TRACK™ ACT™ 12, with increased focus on providing optimized hardware and processes to support advanced packaging, high viscosity, and spin-on hard mask applications. Additionally, this platform integrates the latest transfer system with alignment capability and compact spin modules from our leading edge CLEAN TRACK™ LITHIUS Pro™ Z to improve productivity, reliability, and yield. CLEAN TRACK™ LITHIUS Pro™ AP adopts key innovations from our CLEAN TRACK™ series, contributes to improve productivities and yields on advanced packaging and other key semiconductor operations.

TEL / TOKYO ELECTRON

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