Designed, developed & manufactured high performance and precision chemical processing equipment. Products included electrochemical deposition systems for electroplating copper, gold, solder and other metals; surface preparation systems for cleaning, stripping and etching silicon wafers; and wafer transport container cleaning systems.

This high performance tool cleans, rinses and dries product as large as 300mm round or 300mm square. With 25 wafers per chamber, this tool is available in single or double-bowl configurations. The SRD can be configured to benchtop, stand-alone or bulkhead fab requirements. This tool features Spray - On-axis orientation allows cold or hot (>50ºC) water to evenly spray the wafers. Clean/Rinse - Built-in resistivity monitoring assures an automatic and reliable clean: the process chamber is cleaned with the product: quick-ramp, brushless DC motor provides economy and efficiency. Centrifugal drying, coupled with heated, filtered nitrogen and a low-pressure nitrogen purge with blanket heaters Efficient Chamber Design. Easy to change rotors for simple reconfiguration to match any array of applications. A typical 25-wafer payload takes <7 minutes for a complete cycle (load, rinse, spin dry, unload) Ultra Clean - On-axis orientation keeps wafers parallel, allowing fresh DI water manifolds to spray both sides of the product uniformly Efficient - Up to ten user-defined recipes Low CoO - Smallest footprint with the highest throughput available with over 95% uptime Supports Spray Clean (SRD) Spin-Rinse-DrySpray Clean (SRD) Spin-Rinse-Dry

SEMITOOL

SRD-870S

Equinox is a single wafer, multi-chamber process platform for cassette-to-cassette cleaning, etching, developing, and electroplating. It offers configurations from one to six chambers with a centralized controller and robotics. The platform is capable of performing various processes on substrates ranging from 3" to 200mm in size. It works by using a central dual end-effector robot to transfer substrates from cassette to chamber and back again. Equinox can help automate manual steps and transfers while increasing throughput with a small footprint. It offers ultra-clean dry-to-dry operation with uniform plating and etching results. The platform can integrate sequential process steps with a low cost of ownership (CoO) and provides a migration path from small R&D platforms to production systems with the same process chambers and control features.

EQUINOX

This high performance tool cleans, rinses and dries product as large as 300mm round or 300mm square. With 25 wafers per chamber, this tool is available in single or double-bowl configurations. The SRD can be configured to benchtop, stand-alone or bulkhead fab requirements. This tool features Spray - On-axis orientation allows cold or hot (>50ºC) water to evenly spray the wafers. Clean/Rinse - Built-in resistivity monitoring assures an automatic and reliable clean: the process chamber is cleaned with the product: quick-ramp, brushless DC motor provides economy and efficiency. Centrifugal drying, coupled with heated, filtered nitrogen and a low-pressure nitrogen purge with blanket heaters Efficient Chamber Design. Easy to change rotors for simple reconfiguration to match any array of applications. A typical 25-wafer payload takes <7 minutes for a complete cycle (load, rinse, spin dry, unload) Ultra Clean - On-axis orientation keeps wafers parallel, allowing fresh DI water manifolds to spray both sides of the product uniformly Efficient - Up to ten user-defined recipes Low CoO - Smallest footprint with the highest throughput available with over 95% uptime Supports Spray Clean (SRD) Spin-Rinse-DrySpray Clean (SRD) Spin-Rinse-Dry






SRD-880S

The Storm Series offers advanced centrifugal spray cleaning solutions, ideal for carriers, boxes, and specifically the 300mm Front Opening Unified Pods (FOUPs) and Front Opening Shipping Boxes (FOSBs). Comprising the high-capacity Storm II and the economical Storm III, these cleaners are adept at handling cassette or carrier sizes up to 200mm. Notably, the Storm300 efficiently cleans and dries eight 300mm FOUPs and their doors in under 30 minutes, and can process up to 30 cassettes or FOUPs/FOSBs within an hour. Some of its standout advantages include its cost-effectiveness, making it the world's most economical cassette/box washer, and its high productivity. The Storm's notable features include its ability to rotate products through a DI water spray with an optional surfactant, ensuring thorough cleaning; a centrifugal acceleration drying system complemented by ULPA filtered and heated air; and a user-friendly dual color touch screen interface. Made from electropolished stainless steel, the Storm also boasts an anti-static system, a brushless DC motor drive, and the option for through-the-wall installation, ensuring both efficiency and durability.

STORM III

The Spin Rinser/Dryer (SRD) is a tool that provides a high-speed rinse and dry of wafers. It is designed to achieve low particle counts and reduced DI water consumption, making it an efficient and effective tool for wafer processing. The SRD is 300mm ready, meaning it can accommodate wafers of that size. It also has the option for rinse dry or dry only, allowing for flexibility in its use.

The Spray Acid Tool (SAT) is a versatile tool that offers a range of cleaning, etching, and stripping capabilities. It features a multichamber design that allows for safe and economical operation in a completely closed environment. The SAT is 300mm ready, meaning it can handle wafers of that size. Some of the specific applications of the SAT include post-CMP clean, photo-resist strip, polymer removal, pre-diffusion clean, monitor wafer clean, and metal etch. These processes are essential for the preparation and maintenance of semiconductor wafers during the manufacturing process.

The Spray Solvent Tool (SST) is a world standard in chemical stripping, developing, and cleaning technology. It has a multichamber capability and is 300mm ready. The SST can be used for a variety of processes, including developing, photoresist stripping, polymer removal, pre-metal deposition cleaning, and metal lift-off. This tool provides a versatile and efficient solution for a wide range of applications in the semiconductor industry.

ST 270D

This high performance tool cleans, rinses and dries product as large as 300mm round or 300mm square. With 25 wafers per chamber, this tool is available in single or double-bowl configurations. Introduced in 1979, over 25,000 units have shipped worldwide. The SRD can be configured to benchtop, stand-alone or bulkhead fab requirements. FEATURES Spray - On-axis orientation allows cold or hot (>50ºC) water to evenly spray the wafers Clean/Rinse - Built-in resistivity monitoring assures an automatic and reliable clean: the process chamber is cleaned with the product: quick-ramp, brushless DC motor provides economy and efficiency Dry - Centrifugal drying, coupled with heated, filtered nitrogen and a low-pressure nitrogen purge with blanket heaters Efficient Chamber Design Flexible - Easy to change rotors for simple reconfiguration to match any array of applications Fast - A typical 25-wafer payload takes <7 minutes for a complete cycle (load, rinse, spin dry, unload) Ultra Clean - On-axis orientation keeps wafers parallel, allowing fresh DI water manifolds to spray both sides of the product uniformly Efficient - Up to ten user-defined recipes Low CoO - Smallest footprint with the highest throughput available with over 95% uptime RELATED PROCESSES AND TECHNOLOGIES PROCESSES SUPPORTED Spray Clean (SRD) Spin-Rinse-DrySpray Clean (SRD) Spin-Rinse-Dry

SRD-8300S

The Spray Solvent Tool (SST) is a compact, efficient system that enhances chemical reactions on wafer surfaces. It employs mechanical and centrifugal forces to achieve uniform coverage on both sides of the wafer. The closed loop process control ensures consistent results, while continuous recycling and filtration of chemicals reduce waste. The SST offers precise temperature control and flexibility in chemical delivery methods. With its high throughput, small footprint, and operator safety features, it provides reliable and low-maintenance operation. The tool supports various processes, including GaAs clean, metal lift-off, photoresist removal, post-etch residue removal, and thin film heads. It utilizes technologies such as copper RDL and pillar structures. Flexibility - featuring two, four, or seven tank configuration in small footprint cabinet; process chambers, product carriers, and quick-disconnect rotors are available for wafers up to 200mm

SST 742

SRD-470S

C225

STI 860

ST-270

Introduced to the market during fiscal 2002, the Sirius was designed specifically to deliver HydrOzone process. HydrOzone, using a minimal amount of deionized water and ozone is a low cost process option in comparison to the typical processes used for photoresist stripping, photolithography rework and organic cleans. The Sirius is a manually loaded semi-automated system with a 50 wafer capacity spray processing chamber. The system is available to accommodate either 200mm or 300mm wafer sizes.


SIRIUS

Storm II is an auxiliary system that is the industry’s first batch centrifugal spray cleaning tool for boxes and cassettes. It is unsurpassed by competing technology in terms of cleanliness, ease of use, and economy. The tool can batch clean spray 300mm Capsil and Crystalpak, clean 200mm boxes and cassettes, 95mm three-piece shippers, and 65mm carriers and shippers. With its advanced technology, Storm II provides a reliable and efficient solution for cleaning various types of containers. 

STORM II

SST 421

SRD-480S

Magnum® is a multimodule chemical processing platform that combines solvent, acid, and spin rinser/dryer capabilities into a single automated system. It is designed for high throughput production and has the flexibility for future expansion. The platform is capable of handling 150mm, 200mm, and 300mm wafers. Magnum® is used for wet cleaning and etching processes, including Pre-W-Silicide (HF Vapor), Pre-Salicide Clean, Metal etch, Pre-CVD clean, Pre-diffusion clean, Photoresist strip, Polymer removal, CMP clean, and Reclaim.

MAGNUM

SST 221

System designed to strip photoresist with water soluble

WSST-608-AG

SRD-4300S

SRD-240ST

SP-W-200-SSC-SSC

SSTF42120F	

ST-921R-AA	

SST 441

The Semitool PSC-101 is a Spin Rinse Dryer Controller

PSC 101

WST 406MG 

SP-W-200

SRD-880ST

**PARTS**

ST-240

SRD-840F	

SRD-470F

SRD-260F

SST 201

SRD-460S

SRD-870F

SPECTRUM 504

EOP222SR

SRD-4300F

SST-C-421-280

SRD-860ST

The LT-210 is a single substrate processor that provides a fully automated platform for high throughput production of Cu Interconnect devices. It utilizes Semitool’s advanced electrochemical deposition technology to achieve this. The LT-210 is capable of electrochemical deposition (ECD) of materials such as Copper, Gold, and Solder for Cu Dual Damascene processes. This makes it an ideal tool for the production of high-quality interconnect devices.

LT-210

EO222SR

SRD-470ST

C221280PB

SST-C-221-280	

PSC-102

PDC621-P/FSS-221 

SRD-270F

SRD-2300F

SST 642

SD250

ST 260D

SPECTRUM

SRD-8300-5-1-E-ML

SST-421-280F

SRD-280S

PARAGON

SRD-270S

SRD-480ST

SRD-2300ST

SRD-840ST

SRD-870ST

SRD-8300ST

SRD-440F

During 2000 Semitool introduced Scepter line of spray solvent tools and rinser/dryers. The Scepter products have double the wafer capacity of our standard SST and rinser/dryers while using approximately the same amount of clean room space. This allows an existing fab the ability to increase throughput without adding space. The Scepter is designed for wafers up to 300mm in size.

Scepter SRD

SRD-280F

SRD-280ST

SST 641

ST 260C

P328

SRD-440ST

SP012F1-ASC	

Centurium is a fully automated chemical processing tool designed for flat panel displays. It is capable of performing wet cleaning and etching processes, which are essential steps in the manufacturing of flat panel displays. The tool is equipped with several features, including metal etch, photoresist strip, clean, rinse, and dry. These features allow for a complete and efficient processing of flat panel displays, ensuring high-quality results. With its advanced automation capabilities, Centurium is a reliable and effective solution for the chemical processing needs of flat panel display manufacturers.

CENTURIUM

Scepter SAT

SRD-270ST

SRD-860S

SRD-460F

EQ23

SRD-440S

SRD-840S

SST-C-621-280

ACMS XT II

ST 470

SRD-260S

WSST

SRD-860F

SST 302

SRD-270S-3-1-E-ML

SRD-4300ST

The Advanced Chemical Management System, or ACMS, is an automated electroplating bath control unit. It maintains the desired chemical balance in the plating baths by automatically analyzing and replenishing the chemical constituents using our proprietary technology. Fully integrated with the Company's ECD systems, the primary applications are copper and solder deposition.

ACMS

SRD-460ST

SRD-260ST

SST-C-742-280

The Magnum 3000 designed for the new state-of-the-art 300mm wafer fabs currently planned by customers.


MAGNUM 3000

SST 408

SEMITOOL

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