Description
No descriptionConfiguration
-General Information Cleaning purpose: Back side PolySi removal Equipment classification: Process one by one -Equipment configuration Wafer Type: 26 slots,200mm, Notch Number of cassette sets: 2 cassette SMIF: SMIF-POD (ASYST) -System configuration Wafer robot: Wafer removal and storage from cassette Eco gripper: 2 pairs on the left and right Elevating unit: Lifting and lowering the chuck and dispenser Chuck: Wafer floating by N2 blow Wafer fixing: Fix the wafer with 6 pins Chuck rotation speed: 400～2000rpm Medium dispenser: Arm that supplies chemicals Process pot: The chemical solution is separated and drained with a 4-layer structure Etching position: 1 to 3 from the bottom Rinse and dry position: Top rank CDS(Chemical dispense system): 3 line Chemical configuration Level 1 Unused Level 2 HNO3+DIW （Unused） Level 3 HF+H2O2 Level 4 DIW dispenser nozzle configuration Chemical 3 line DIW 1 line N2 1 line Heat Exchangers configuration Medium DIW Temperature setting range Room temperature～50℃OEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
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Verified
CATEGORY
Wet Etch
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146833
Wafer Sizes:
Unknown
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / SEZ
SP203
CATEGORY
Wet Etch
Last Verified: 6 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146833
Wafer Sizes:
Unknown
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-General Information Cleaning purpose: Back side PolySi removal Equipment classification: Process one by one -Equipment configuration Wafer Type: 26 slots,200mm, Notch Number of cassette sets: 2 cassette SMIF: SMIF-POD (ASYST) -System configuration Wafer robot: Wafer removal and storage from cassette Eco gripper: 2 pairs on the left and right Elevating unit: Lifting and lowering the chuck and dispenser Chuck: Wafer floating by N2 blow Wafer fixing: Fix the wafer with 6 pins Chuck rotation speed: 400～2000rpm Medium dispenser: Arm that supplies chemicals Process pot: The chemical solution is separated and drained with a 4-layer structure Etching position: 1 to 3 from the bottom Rinse and dry position: Top rank CDS(Chemical dispense system): 3 line Chemical configuration Level 1 Unused Level 2 HNO3+DIW （Unused） Level 3 HF+H2O2 Level 4 DIW dispenser nozzle configuration Chemical 3 line DIW 1 line N2 1 line Heat Exchangers configuration Medium DIW Temperature setting range Room temperature～50℃OEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
No documents