Description
No descriptionConfiguration
-standard handling with standard chuck and vacuum EEF -RDM module (rinse and dry module for special clean and dry application after process on standard chuck; removes ---chemical residues at frontside after standard process on chuck ) -windows 3.11 operating system (very stable) -very new chemical modules (3pcs) with new chemical controller -standard Brooks ATM robot handlings system -running operating system with tool SW -TestedOEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
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LAM RESEARCH / SEZ
SP203
Verified
CATEGORY
Wet Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116204
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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LAM RESEARCH / SEZ
SP203
CATEGORY
Wet Etch
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116204
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
-standard handling with standard chuck and vacuum EEF -RDM module (rinse and dry module for special clean and dry application after process on standard chuck; removes ---chemical residues at frontside after standard process on chuck ) -windows 3.11 operating system (very stable) -very new chemical modules (3pcs) with new chemical controller -standard Brooks ATM robot handlings system -running operating system with tool SW -TestedOEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
No documents