Description
Completeness partial - Z80 missing - CDS not runningConfiguration
Spinprocessor Type 10OEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
No documents
LAM RESEARCH / SEZ
SP203
Verified
CATEGORY
Wet Etch
Last Verified: 22 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116002
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View AllLAM RESEARCH / SEZ
SP203
CATEGORY
Wet Etch
Last Verified: 22 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
116002
Wafer Sizes:
Unknown
Vintage:
2004
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Completeness partial - Z80 missing - CDS not runningConfiguration
Spinprocessor Type 10OEM Model Description
The SEZ 203 Spin-Processor is a single wafer processing system that can use up to three different chemical solutions in a programmable sequence for processing wafers. It is capable of processing wafers with sizes of 125mm, 150mm, and 200mm. It has options like Endpoint Detection System, ozone processing, and contamination-free robot handling. It supports applications such as Photolithography Yield Enhancement, Back Surface Metal Clean, and Silicon Etch. The system can recycle, heat, and filter chemical solutions or use them in a single pass mode.Documents
No documents