Description
Lithography Lithography MachineConfiguration
No ConfigurationOEM Model Description
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.Documents
No documents
NIKON
NSR-2205i11D
Verified
CATEGORY
Steppers & Scanners
Last Verified: 23 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115689
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
NIKON
NSR-2205i11D
CATEGORY
Steppers & Scanners
Last Verified: 23 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
115689
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Lithography Lithography MachineConfiguration
No ConfigurationOEM Model Description
The NSR-2205i11D offers a resolution of 350nm or better and features a numerical aperture (NA) of 0.63. It utilizes an i-line (365nm) exposure light source and has a reduction ratio of 1:5. The exposure field ranges from a 22mm square to 17.9(H) x 25.2(V)mm. The alignment accuracy, using the EGA method, is 70nm or better. The system is equipped with the LSA alignment system as standard, and optionally offers the FIA and LIA alignment systems.Documents
No documents