Description
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: GXT type (Upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4Configuration
No ConfigurationOEM Model Description
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.Documents
No documents
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
Verified
CATEGORY
ICP
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
81932
Wafer Sizes:
12"/300mm
Vintage:
2003
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
CATEGORY
ICP
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
81932
Wafer Sizes:
12"/300mm
Vintage:
2003
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Process: PR Strip 1. System Configuration: Main System Load Port: Brooks Fixload TM V6 EFEM Robot: 02-169208-00 Aligner: Yaskawa RF Rack: Generator ENI GHW-50A-04 5ea UI Panel Light Curtain: KEYENCE Signal Cable (RF Cable Included) 2. Process Chamber Configuration: GXT type (Upgrade Bell jar and Quartz tube) EPD: 4ea(#2,#3,#4,#5 Port) RF Matcher: CPMX-3000 5ea RF Source: 02-352103-00 5ea Load/Unload Port HDIS Pedestal: #2, #3, #,1, #6 Fixed Pedestal: #4, #5 Stage #1: Preheat Yaskawa Spindle Athenta Computer UI Computer Gate Valve: MDC ISO Valve Throttle Valve: NC Slit Valve: V-TEX Manometer: MKS 10 Torr Gas Box: MFC #1 Brooks O2, MFC #2 Brooks N2, MFC #3 Brooks H2N2, MFC #4 Brooks CF4Configuration
No ConfigurationOEM Model Description
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.Documents
No documents