The Maxis-300LCH is a state-of-the-art ICP etcher from GigaLane, renowned for dominating the global market in PSS processing technology since 2012. Designed to enhance the light extraction efficiency of LED chips, this equipment boasts exceptional pattern uniformity and a high aspect ratio, along with a variety of etching patterns. It offers a broad process window and advanced particle control, catering to the latest LED industry trends, including flip-chip packaging. The Maxis-300LCH, pivotal for the PSS process, is versatile enough to handle additional etching processes like GaN and Oxide etch. GigaLane ensures rapid technological support through its in-house DEMO lab, fully equipped for lithography, rinsing, and process analysis in a clean-room setting.

GIGALANE

MAXIS-300LCH

The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.

Novellus acquired Gasonics in 2001. Novellus now offers a suite of advanced photoresist strip and clean products. 

ICP

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MAXIS-300LCH

GAMMA 2130

ICP ETCHER

HIETCH-LX200