Description
RESIST CLEAN, CUConfiguration
No ConfigurationOEM Model Description
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.Documents
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LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
Verified
CATEGORY
ICP
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
101694
Wafer Sizes:
Unknown
Vintage:
Unknown
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Money Back Guarantee
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Refurbishment Services
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LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2130
CATEGORY
ICP
Last Verified: Over 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
101694
Wafer Sizes:
Unknown
Vintage:
Unknown
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
RESIST CLEAN, CUConfiguration
No ConfigurationOEM Model Description
The GAMMA 2130 system is a front-end-of-line (FEOL) photoresist strip system for 300mm wafers. Our multi-station sequential processing architecture incorporates six stations within a single process chamber, enabling a 30 percent higher throughput rate when compared to that of the closest competitor.Documents
No documents