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AXCELIS GSD 200E2
    Description
    High Current Implanter
    Configuration
    No Configuration
    OEM Model Description
    The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.
    Documents

    No documents

    verified-listing-icon

    Verified

    CATEGORY
    High Current

    Last Verified: Yesterday

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    137385


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    AXCELIS GSD 200E2

    AXCELIS

    GSD 200E2

    High Current
    Vintage: 0Condition: Used
    Last VerifiedYesterday

    AXCELIS

    GSD 200E2

    verified-listing-icon
    Verified
    CATEGORY
    High Current
    Last Verified: Yesterday
    listing-photo-5835e1c3b11d435fb128d224c9123d2e-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    137385


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    High Current Implanter
    Configuration
    No Configuration
    OEM Model Description
    The GSD/200E2 is a 200mm standard high current implanter with a maximum energy of 180KeV. It offers reliable, high productivity and exceptional product control with unmatched cost of ownership. It meets advanced manufacturing requirements through the 180nm node and maintains high throughput for quad implants used for trench doping. It features an Extended Life Source, a Xenon-based Plasma Electron Flood, and real-time dose control for consistent low doses.
    Documents

    No documents

    Similar Listings
    View All
    AXCELIS GSD 200E2

    AXCELIS

    GSD 200E2

    High CurrentVintage: 0Condition: UsedLast Verified:Yesterday
    AXCELIS GSD 200E2

    AXCELIS

    GSD 200E2

    High CurrentVintage: 0Condition: UsedLast Verified:Over 30 days ago