November 10, 2011 – Applied Materials, Inc. announced the successful completion of its acquisition of Varian Semiconductor Equipment Associates, Inc. 
Varian is the leading supplier of ion implantation equipment used by chip makers and has been applying this technology to crystalline silicon wafers for photovoltaic panels. Varian will operate as a business unit of Applied's Silicon Systems Group.

APPLIED MATERIALS (AMAT) / VARIAN

VIISta HC

The Applied Quantum X Implant system, along with Applied's other technologies, meets the strict requirements for 65nm transistors. It offers high throughput at low energies, uniformity across all points and wafers, and precise motion control to prevent particle damage. The system is extendible to new applications for advanced logic and memory devices. Quantum X redefines fab productivity for high current ion implantation by providing single-wafer precision, ultra-low defect levels, and high throughput. Its innovative technology enables extendibility to high tilt implant and other new applications at 65nm and beyond. It features high throughput at low energies (200eV - 80keV) with all points, all wafers uniformity and two-dimensional parallel scanning with StepScan™ fixed beam technology for single wafer processing and up to 60° tilt angle

Applied Materials is committed to accelerating this new PPACt playbook for our customers and partners. We have the broadest and deepest portfolio of products for delivering PPACt innovations to the market. This portfolio encompasses the ability to create and deposit, shape and remove, modify, analyze, and connect materials and devices in new ways. We are unique in having a broad suite of process technology and metrology capabilities under one roof, and we have highly differentiated silicon and packaging lab capabilities. Our Integrated Materials Solutions co-optimize materials deposition, removal, modification, and analysis to create new materials and engineer new structures for high-performance, low-power chips at leading-edge nodes.

APPLIED MATERIALS (AMAT)

QUANTUM X

VARIAN VIISION 200+ is a high current implanters system. The VIISION 200+ can produce wafer size of 200 mm.

VIISion 200+

The Varian E1000 is a high current implanter that leverages Varian’s pioneering single-wafer high current technology to deliver high yields and the industry’s best productivity. Innovations on the dual-magnet ribbon beam architecture improve beam line transmission, on-wafer beam utilization, and beam current output.

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VIISta HC

QUANTUM X

VIISion 200+

E1000