VIISta HCP
Category
High CurrentOverview
The VIISta HCP series is a high current single wafer ion implanter that offers high productivity and excellent contamination performance. It features implant angle accuracy, beam steering correction, and high-tilt angle capability, making it suitable for advanced device fabrication. With its excellent process control capability, the VIISta HCP is ideal for advanced ultra shallow junction applications such as source/drain, source/drain extension, gate doping, pre-amorphization, and materials modification. It has an energy range of 200 eV to 60 keV and a dose range of 1 x 10^13 to 5 x 10^16 ions/cm^-2.
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APPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High CurrentVintage: 2006Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High CurrentVintage: 2006Condition: UsedLast VerifiedOver 60 days agoAPPLIED MATERIALS (AMAT) / VARIAN
VIISta HCP
High CurrentVintage: Condition: Parts ToolLast VerifiedOver 60 days ago