Description

ALPHA8SE (3 LOTS) No known issue

Configuration

oxidation process Process Gas: N2、O2、Ar、H2、HCL、Air Thin Oxide (C/W)

OEM Model Description

The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.

Documents

TEL TOKYO ELECTRON ALPHA-8SE.pdf

TEL / TOKYO ELECTRON

ALPHA-8SE

Verified

Furnaces / Diffusion

Last Verified: 2 days ago

Key Item Details

Condition:

Used

Operational Status:

Installed / Running

Product ID:

142665

Wafer Sizes:

8"/200mm

Vintage:

Unknown

Logistics Support

Available

Transaction Insured by Moov

Available

Refurbishment Services

Available

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