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TEL / TOKYO ELECTRON ALPHA-8SE
    Description
    ALPHA8SE (3 LOTS) Main heater has sustained partial damage
    Configuration
    oxidation process Process Gas: N2、O2、Ar、H2、HCL、Air Thin Oxide (C/W)
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    Documents
    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: 2 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Installed / Running


    Product ID:

    142664


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / Diffusion
    Vintage: 0Condition: Used
    Last Verified2 days ago

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: 2 days ago
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/fdb49928cb2a45608edce56ebe887348_picture3_mw.jpg
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/e6e70d2c597444aa8eee9dc4886092d5_picture2_mw.jpg
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/756778074ea84bce9a3fb315d03b6a41_1_mw.jpg
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/b7eee7d5091a454aa971938de7a5a3a8_picture4_mw.jpg
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/ff80711fed9e46c9b9209610a69eac75_picture9_mw.png
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/239ec1dc8f394479839ba94766356b1e_picture7_mw.png
    listing-photo-306b27c71ce0492e98fff01355460e9b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/53254/306b27c71ce0492e98fff01355460e9b/b626e656591947eb9389d5be2489ffeb_picture8_mw.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Installed / Running


    Product ID:

    142664


    Wafer Sizes:

    8"/200mm


    Vintage:

    Unknown


    Logistics Support
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    ALPHA8SE (3 LOTS) Main heater has sustained partial damage
    Configuration
    oxidation process Process Gas: N2、O2、Ar、H2、HCL、Air Thin Oxide (C/W)
    OEM Model Description
    The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 0Condition: UsedLast Verified:2 days ago
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 0Condition: UsedLast Verified:2 days ago
    TEL / TOKYO ELECTRON ALPHA-8SE

    TEL / TOKYO ELECTRON

    ALPHA-8SE

    Furnaces / DiffusionVintage: 0Condition: UsedLast Verified:2 days ago