Description
General System Layout Main, Utility System Type L-type Side Maintenance Installed System Paint Color Ivory Furnace Front Surface Finish SUS Heater Model VMM 40-101 Rapid Cooling Unit Not Installed N2 Load Lock Installed O2 Analyzer Installed/LC750 Cassette I/O Type Normal I/O Type SMIF Maker/Model Not Installed AGV Compatibility Unable System Main Controller WAVES Mechanical Controller - Sequence Controller - Gas Controller - Furnace Temperature Controller - Furnace Over Temp Detector - Host Communications - User Host Computer I/F - Gas Flow Chart Pannel Installed (Front , Rear) Operation Pannel Installed (Front) Signal Tower/Colors Not Installed Gas Detector Maker/Model RIKEN KEIKI Detecting Gas AsH3, SiH4, ClF3 Manual (Drawing, Parts list etc.) Not Included Gas System Process Gas N2, SiH4, Ph3, ClF3 Basic Style Integrated Gas System(Fujikin) Manual Valve FUJIKIN Air-Operated Valve FUJIKIN Filter TOSHIBA Regulator VERIFLO MFC Maker/Model UNIT/UFC 1661 PT Sensor Maker/Model MKS DPM Maker/Model MKS Check Valve FUJIKIN Baking System N/A Liquid Source Auto-Refill N/A Burn Controller N/A Vaporizer N/A Vacuum/Exhaust Pump*1 N/A Pressure Control Valve N/A Pressure Controller N/A Pressure Sensor N/A Trap Not Installed Gas Cooler N/A Wafer/Cassette Handling Wafer Type 200 mm Flat-zone Type Auto Wafer Aligner Installed Wafer Qty. in Cassette 26 Cassette Storage Qty. 21 Fork Type 1 + 4 Fork-Wafer Presence Sensor Installed Fork-Variable Pitch Installed Magnetic Seal Rotation InstalledConfiguration
Alpha-8SE LPCVD Doped-polyOEM Model Description
The Alpha-8SE is a batch thermal processing system that covers multiple applications over a wide temperature range. It was introduced for 200mm wafer processing in the mid-1990s and has undergone continuous improvements to productivity, reliability, and stability. The Alpha-8SE supports 100/150/200mm wafer sizes and up to 150 wafer batch size for semiconductor thin film applications including oxidation & anneal, LPCVD of Si (Poly, a-Si), Si3N4, SiO2, and high-k ALD. It enables performance for today’s most advanced diffusion and deposition processes such as ALD (Atomic Layer Deposition), low-pressure radical oxidation, and low-temperature nitrides.Documents
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Yesterday
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
138693
Wafer Sizes:
8"/200mm
Vintage:
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Similar Listings
View All
TEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2006Condition: Used
Last Verified7 days ago
TEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2004Condition: Used
Last Verified7 days ago
TEL / TOKYO ELECTRON
ALPHA-8SE
Furnaces / DiffusionVintage: 2002Condition: Used
Last Verified7 days ago
TEL / TOKYO ELECTRON
ALPHA-8SE
CATEGORY
Furnaces / Diffusion
Last Verified: Yesterday
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
138693
Wafer Sizes:
8"/200mm
Vintage:
2004
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available