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KLA SP1 CLASSIC
  • KLA SP1 CLASSIC
  • KLA SP1 CLASSIC
  • KLA SP1 CLASSIC
Description
No description
Configuration
No Configuration
OEM Model Description
The Surfscan® SP1 is an unpatterned surface inspection system that provides the sensitivity, repeatability, surface quality measurements and throughput capabilities required for 0.18 µm process technologies and beyond. It is designed for wafer, equipment and IC manufacturers. The SP1 provides 0.08 µm sensitivity on well-polished silicon at 95% capture, as well as throughputs of up to 150 wph on 200 mm wafers, and up to 100 wph on 300 mm wafers.
Documents

No documents

PREFERRED
 
SELLER
CATEGORY
Defect Inspection

Last Verified: Over 60 days ago

Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

92341


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
PREFERRED
 
SELLER

KLA

SP1 CLASSIC

verified-listing-icon
Verified
CATEGORY
Defect Inspection
Last Verified: Over 60 days ago
listing-photo-ce0eeb2fcbbb4ea4bea4704a4f362e8c-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
Buyer pays 12% premium of final sale price
Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

92341


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No description
Configuration
No Configuration
OEM Model Description
The Surfscan® SP1 is an unpatterned surface inspection system that provides the sensitivity, repeatability, surface quality measurements and throughput capabilities required for 0.18 µm process technologies and beyond. It is designed for wafer, equipment and IC manufacturers. The SP1 provides 0.08 µm sensitivity on well-polished silicon at 95% capture, as well as throughputs of up to 150 wph on 200 mm wafers, and up to 100 wph on 300 mm wafers.
Documents

No documents