Description
Operation: Running production until early 2024, been in storage since March 2024Configuration
PROCESS BLOCK : 1 COATER, 2 DEVELOPER BLOCK TYPE : DUAL WAFER FLOW : RIGHT to LEFT CSB / Cassette station block -OPEN UNI-CASSETTE/NON SMIF PSB / Process station block 2-1 : COAT -2 BELLOWS PR PUMP -EBR -2 Back Rinse nozle 3-2 : DEV -DUAL RINSE NOZZLE -H-NOZZLE 3-3 : DEV -DUAL RINSE NOZZLE -H-NOZZLE IFB / Interface station block -Interface arm -Interface for NIKON Stepper -1 Buffer -1 Pick up -2 Wafer stage TEMPERATURE AND HUMIDITY CONTROLLER -T&H-CPC , SHINWA 1 unit PHOTO RESIST SUPPLY SYSTEM -Internal 2-bottle THRMO CONTROLLER -MR-2015 : 3 unit -FRD-8-B : 2 unit EXTERNAL CIRCULATOR CABINET -MCE-52W-B : 2 unit, 2 unit-missing *MISSING -EBR NOZZLE 1 -PR NOZZEL / DELIVEYR LINE 2 -MCE-52 CIRCULATOR 2OEM Model Description
Discover the CLEAN TRACK Mark 8, the cutting-edge coater developer system for 5 to 8-inch wafers. Building on the legacy of the acclaimed Mark V, this advanced model delivers enhanced productivity, superior scalability, and exceptional environmental control. Perfect for R&D and high-volume manufacturing, the Mark 8 ensures stable, top-tier performance for diverse applications.Documents
No documents
Verified
CATEGORY
Coaters & Developers
Last Verified: 21 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
120432
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
TEL / TOKYO ELECTRON
MARK 8
CATEGORY
Coaters & Developers
Last Verified: 21 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
120432
Wafer Sizes:
8"/200mm
Vintage:
1998
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Operation: Running production until early 2024, been in storage since March 2024Configuration
PROCESS BLOCK : 1 COATER, 2 DEVELOPER BLOCK TYPE : DUAL WAFER FLOW : RIGHT to LEFT CSB / Cassette station block -OPEN UNI-CASSETTE/NON SMIF PSB / Process station block 2-1 : COAT -2 BELLOWS PR PUMP -EBR -2 Back Rinse nozle 3-2 : DEV -DUAL RINSE NOZZLE -H-NOZZLE 3-3 : DEV -DUAL RINSE NOZZLE -H-NOZZLE IFB / Interface station block -Interface arm -Interface for NIKON Stepper -1 Buffer -1 Pick up -2 Wafer stage TEMPERATURE AND HUMIDITY CONTROLLER -T&H-CPC , SHINWA 1 unit PHOTO RESIST SUPPLY SYSTEM -Internal 2-bottle THRMO CONTROLLER -MR-2015 : 3 unit -FRD-8-B : 2 unit EXTERNAL CIRCULATOR CABINET -MCE-52W-B : 2 unit, 2 unit-missing *MISSING -EBR NOZZLE 1 -PR NOZZEL / DELIVEYR LINE 2 -MCE-52 CIRCULATOR 2OEM Model Description
Discover the CLEAN TRACK Mark 8, the cutting-edge coater developer system for 5 to 8-inch wafers. Building on the legacy of the acclaimed Mark V, this advanced model delivers enhanced productivity, superior scalability, and exceptional environmental control. Perfect for R&D and high-volume manufacturing, the Mark 8 ensures stable, top-tier performance for diverse applications.Documents
No documents