Description
Develops Only 2. Controller: ACT Controller 3. Configuration: 4DEV 4. Stepper interface: No 5. Wafer Direction: RtoL 6. Accessory 6.1.AC Power Box 200V/100A 6.2.AC Power Cable: 3 phase 6.3.TCU 6.3.1. Model: INR-244-265B-2400 6.5.Chiller 6.5.1. Model: HCW 5,000-PR-NF-M 6.6.Chemical Cabinet (Qty): 1 7. Develop Units 7.1.Unit 2-1 7.1.1. Develop Nozzle Qty: 2 7.1.2. Develop Nozzle type: H nozzle 7.1.3. Develop Nozzle Move type: Horizontal 7.1.4. Top Rinse nozzle (Qty): 1 7.1.5. Bottom Rinse (Qty): 2 7.1.6. Developer Temp Control: Yes 7.1.7. Auto Damper: Yes 7.1.8. Auto Rinse: Yes 7.2.Unit 2-2 7.2.1. Develop Nozzle Qty: 2 7.2.2. Develop Nozzle type: H nozzle 7.2.3. Develop Nozzle Move type: Horizontal 7.2.4. Top Rinse nozzle (Qty): 1 7.2.5. Bottom Rinse (Qty): 2 7.2.6. Developer Temp Control: Yes 7.2.7. Auto Damper: Yes 7.2.8. Auto Rinse: Yes 7.3.Unit 2-3 7.3.1. Develop Nozzle Qty:2 7.3.2. Develop Nozzle type: H nozzle 7.3.3. Develop Nozzle Move type: Horizontal 7.3.4. Top Rinse nozzle (Qty): 1 7.3.5. Bottom Rinse (Qty): 2 7.3.6. Developer Temp Control: Yes 7.3.7. Auto Damper: Yes 7.3.8. Auto Rinse: Yes 7.4.Unit 2-4 7.4.1. Develop Nozzle Qty: 2 7.4.2. Develop Nozzle type: H nozzle 7.4.3. Develop Nozzle Move type: Horizontal 7.4.4. Top Rinse nozzle (Qty): 1 7.4.5. Bottom Rinse (Qty): 2 7.4.6. Developer Temp Control: Yes 7.4.7. Auto Damper: Yes 7.4.8. Auto Rinse: Yes 8. All Units (Qty) 8.1.Coater Units (Qty): 0 8.2.Develop Units (Qty):4 8.3.CHP Units (Qty):4 8.4.LHP Units (Qty): 6 8.5.HHP Units (Qty): 2 8.6.PHP Units (Qty): 0 8.7.CPL Units (Qty): 4 8.8.ADH Units (Qty):0 8.9.TRS Units (Qty):1 8.10.TCP Units (Qty): 1 8.11.WEE Units (Qty): 0 8.12.PEB Units (Qty): 0 8.13.FFB Units (Qty): 0 8.14.RDW Units (Qty): 0 8.15.IRA Block: No 8.16.CSB: No 8.17.CWH: No 8.18.CWD: No 8.19.TRS: NoConfiguration
Single Block 4DOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
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Verified
CATEGORY
Coaters & Developers
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146150
Wafer Sizes:
6"/150mm
Vintage:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
CATEGORY
Coaters & Developers
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146150
Wafer Sizes:
6"/150mm
Vintage:
2005
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Develops Only 2. Controller: ACT Controller 3. Configuration: 4DEV 4. Stepper interface: No 5. Wafer Direction: RtoL 6. Accessory 6.1.AC Power Box 200V/100A 6.2.AC Power Cable: 3 phase 6.3.TCU 6.3.1. Model: INR-244-265B-2400 6.5.Chiller 6.5.1. Model: HCW 5,000-PR-NF-M 6.6.Chemical Cabinet (Qty): 1 7. Develop Units 7.1.Unit 2-1 7.1.1. Develop Nozzle Qty: 2 7.1.2. Develop Nozzle type: H nozzle 7.1.3. Develop Nozzle Move type: Horizontal 7.1.4. Top Rinse nozzle (Qty): 1 7.1.5. Bottom Rinse (Qty): 2 7.1.6. Developer Temp Control: Yes 7.1.7. Auto Damper: Yes 7.1.8. Auto Rinse: Yes 7.2.Unit 2-2 7.2.1. Develop Nozzle Qty: 2 7.2.2. Develop Nozzle type: H nozzle 7.2.3. Develop Nozzle Move type: Horizontal 7.2.4. Top Rinse nozzle (Qty): 1 7.2.5. Bottom Rinse (Qty): 2 7.2.6. Developer Temp Control: Yes 7.2.7. Auto Damper: Yes 7.2.8. Auto Rinse: Yes 7.3.Unit 2-3 7.3.1. Develop Nozzle Qty:2 7.3.2. Develop Nozzle type: H nozzle 7.3.3. Develop Nozzle Move type: Horizontal 7.3.4. Top Rinse nozzle (Qty): 1 7.3.5. Bottom Rinse (Qty): 2 7.3.6. Developer Temp Control: Yes 7.3.7. Auto Damper: Yes 7.3.8. Auto Rinse: Yes 7.4.Unit 2-4 7.4.1. Develop Nozzle Qty: 2 7.4.2. Develop Nozzle type: H nozzle 7.4.3. Develop Nozzle Move type: Horizontal 7.4.4. Top Rinse nozzle (Qty): 1 7.4.5. Bottom Rinse (Qty): 2 7.4.6. Developer Temp Control: Yes 7.4.7. Auto Damper: Yes 7.4.8. Auto Rinse: Yes 8. All Units (Qty) 8.1.Coater Units (Qty): 0 8.2.Develop Units (Qty):4 8.3.CHP Units (Qty):4 8.4.LHP Units (Qty): 6 8.5.HHP Units (Qty): 2 8.6.PHP Units (Qty): 0 8.7.CPL Units (Qty): 4 8.8.ADH Units (Qty):0 8.9.TRS Units (Qty):1 8.10.TCP Units (Qty): 1 8.11.WEE Units (Qty): 0 8.12.PEB Units (Qty): 0 8.13.FFB Units (Qty): 0 8.14.RDW Units (Qty): 0 8.15.IRA Block: No 8.16.CSB: No 8.17.CWH: No 8.18.CWD: No 8.19.TRS: NoConfiguration
Single Block 4DOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
No documents