Description
Drain Pump for unit 2-2 is missing from tool Tool has not run since 1/12/25 due to needing FSE work Controller: ACT Controller Configuration: 2COT/2DEV Stepper interface: No Wafer Direction: RtoL Accessory AC Power Box: 200V/125A AC Power Cable: 3 phase TCU Model: INR-244-211V-45 T&H Model: SPA-1822-i Chiller Model: CW5000PR-NF-L-NCB-M Chemical Cabinet (Qty): 1 Coater Unit Unit 2-1 Resist Nozzles (Qty): 4 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Unit 2-2 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Develop Units Unit 2-3 Develop Nozzle Qty: 4 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes Unit 2-4 Develop Nozzle Qty: 4 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes All Units (Qty) Coater Units (Qty):2 Develop Units (Qty):2 CHP Units (Qty):4 LHP Units (Qty): 6 HHP Units (Qty): 2 PHP Units (Qty): 0 CPL Units (Qty): 4 ADH Units (Qty):2 TRS Units (Qty):2 1TCP Units (Qty): 1 1WEE Units (Qty):0 1PEB Units (Qty): 0 1FFB Units (Qty): 0 1RDW Units (Qty): 0 1IRA Block: No 1CSB: No 1CWH: Yes 1CWD: No 1TRS: NoConfiguration
2C2D Single BlockOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
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Verified
CATEGORY
Coaters & Developers
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146148
Wafer Sizes:
6"/150mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
ACT 8
CATEGORY
Coaters & Developers
Last Verified: Today
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
146148
Wafer Sizes:
6"/150mm
Vintage:
2000
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Drain Pump for unit 2-2 is missing from tool Tool has not run since 1/12/25 due to needing FSE work Controller: ACT Controller Configuration: 2COT/2DEV Stepper interface: No Wafer Direction: RtoL Accessory AC Power Box: 200V/125A AC Power Cable: 3 phase TCU Model: INR-244-211V-45 T&H Model: SPA-1822-i Chiller Model: CW5000PR-NF-L-NCB-M Chemical Cabinet (Qty): 1 Coater Unit Unit 2-1 Resist Nozzles (Qty): 4 Resist Pumps (Type):F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain type: Buffer Drain Unit 2-2 Resist Nozzles (Qty): 4 Resist Pumps (Type): F-T100-3 EBR/RRC/BSR: Yes Temp/Humidity sensor: Yes PR auto exchange system: Yes Photo Resist Temp control: No Motor Flange Temp control: Yes Photo Resist Drain: Buffer drain Develop Units Unit 2-3 Develop Nozzle Qty: 4 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes Unit 2-4 Develop Nozzle Qty: 4 Develop nozzle type: H nozzle Develop Nozzle Move type: Horizontal Top Rinse nozzle (Qty): 1 Bottom Rinse (Qty): 2 Developer Temp Control: Yes Auto Damper: Yes Auto Rinse: Yes All Units (Qty) Coater Units (Qty):2 Develop Units (Qty):2 CHP Units (Qty):4 LHP Units (Qty): 6 HHP Units (Qty): 2 PHP Units (Qty): 0 CPL Units (Qty): 4 ADH Units (Qty):2 TRS Units (Qty):2 1TCP Units (Qty): 1 1WEE Units (Qty):0 1PEB Units (Qty): 0 1FFB Units (Qty): 0 1RDW Units (Qty): 0 1IRA Block: No 1CSB: No 1CWH: Yes 1CWD: No 1TRS: NoConfiguration
2C2D Single BlockOEM Model Description
CLEAN TRACK™ ACT™ 8 is a state-of-the-art Coater/Developer designed for 75-200mm wafers. It offers stable, high-quality processing and enables a smooth transition from R&D to volume production. When used in-line with the exposure tool, the system has a similar footprint to its predecessors, but provides higher throughput due to its faster wafer transfer speed. The uptime has improved due to the increased reliability of components and ease of maintenance. The platform also uses a chemical filter and a high precision oven to support DUV processing. This makes it an ideal choice for those looking for a reliable and efficient Coater/Developer.Documents
No documents