Description
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The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.Documents
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LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
Verified
CATEGORY
Ashers / Plasma Cleaner
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
74426
Wafer Sizes:
Unknown
Vintage:
Unknown
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LAM RESEARCH / NOVELLUS / GASONICS
GAMMA 2100
CATEGORY
Ashers / Plasma Cleaner
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
74426
Wafer Sizes:
Unknown
Vintage:
Unknown
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
No descriptionConfiguration
No ConfigurationOEM Model Description
The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.Documents
No documents