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LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100
    Description
    ASHER
    Configuration
    No Configuration
    OEM Model Description
    The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
    Documents

    No documents

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    verified-listing-icon

    Verified

    CATEGORY
    Ashers / Plasma Cleaner

    Last Verified: Over 30 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    111882


    Wafer Sizes:

    8"/200mm


    Vintage:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    Ashers / Plasma Cleaner
    Vintage: 0Condition: Used
    Last Verified4 days ago

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    verified-listing-icon
    Verified
    CATEGORY
    Ashers / Plasma Cleaner
    Last Verified: Over 30 days ago
    listing-photo-738bd4ed38aa4b9db2f459e32a2fd207-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    111882


    Wafer Sizes:

    8"/200mm


    Vintage:

    2002


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    ASHER
    Configuration
    No Configuration
    OEM Model Description
    The GAMMA 2100 200mm photoresist removal system uses a plasma source to strip photoresist. The GAMMA architecture features a multi-station sequential processing design with six strip stations, resulting in high wafer throughput with a minimal number of critical subsystems.
    Documents

    No documents

    Similar Listings
    View All
    LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:4 days ago
    LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    Ashers / Plasma CleanerVintage: 2002Condition: UsedLast Verified:Over 30 days ago
    LAM RESEARCH / NOVELLUS / GASONICS GAMMA 2100

    LAM RESEARCH / NOVELLUS / GASONICS

    GAMMA 2100

    Ashers / Plasma CleanerVintage: 0Condition: UsedLast Verified:Over 60 days ago