Description
Asset Description: Bruker D8 Fabline X-Ray Diffractometer Software Version: XP CIM: NA Process: XRDConfiguration
Hardware Configuration System Type Description Quantity Main System NA Handler System NA Factory Interface NONE Others NA Options System NA Excluded Items List (Pumps, Chillers & Abatement are all excluded) Description Quantity X-Ray generator 1 needs repair/OEM Model Description
The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.Documents
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Verified
CATEGORY
X-Ray / XRD / XRF
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
141599
Wafer Sizes:
12"/300mm
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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BRUKER
D8 FABLINE
CATEGORY
X-Ray / XRD / XRF
Last Verified: 30 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
141599
Wafer Sizes:
12"/300mm
Vintage:
2011
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Asset Description: Bruker D8 Fabline X-Ray Diffractometer Software Version: XP CIM: NA Process: XRDConfiguration
Hardware Configuration System Type Description Quantity Main System NA Handler System NA Factory Interface NONE Others NA Options System NA Excluded Items List (Pumps, Chillers & Abatement are all excluded) Description Quantity X-Ray generator 1 needs repair/OEM Model Description
The D8 FABLINE provides fully automated handling of 300mm wafers . It provides a wide spectrum of techniques, such as rapid X-ray reflectivity (XRR), grazing incidence X-ray diffraction (GID), and high-resolution X-ray diffraction (HR-XRD) in order to facilitate advanced process development and control on strained devices and high-K thin films, as well as materials characterization for future generation technology nodes.Documents
No documents