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TEL / TOKYO ELECTRON TELFORMULA
    Description
    Type: TELFORMULA-1S-M Diffusion (Amorphous Anneal, ɑ-Si) Wafer Size: 300mm Vintage: 2009 S/W Version: 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78754


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / Diffusion
    Vintage: 2003Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-c2319d012a0b4e1b89fbf01cc10b4a82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/c2319d012a0b4e1b89fbf01cc10b4a82/34e1081381fb415fb540604b2813293f_d195138f7d8845c4b6d1f3fe204cbb9045005c_mw.jpeg
    listing-photo-c2319d012a0b4e1b89fbf01cc10b4a82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/c2319d012a0b4e1b89fbf01cc10b4a82/05740cb68bb048a983af419d7a6078f1_293c9c177f6d4c2385185b3c3dbce0911201a_mw.jpeg
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    listing-photo-c2319d012a0b4e1b89fbf01cc10b4a82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/c2319d012a0b4e1b89fbf01cc10b4a82/eb7081455b4841dd92a33381b1c10e35_9b4e729bd19440fbb21dbccb6d29026608e7eb36aed04b3186cef3ea33b613c81201af_mw.jpeg
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    listing-photo-c2319d012a0b4e1b89fbf01cc10b4a82-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/c2319d012a0b4e1b89fbf01cc10b4a82/5825b35b076940e3a979db205bcd85cc_91eabf20eb854c3f81fd2599e1b9e1111201a_mw.jpeg
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    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78754


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Type: TELFORMULA-1S-M Diffusion (Amorphous Anneal, ɑ-Si) Wafer Size: 300mm Vintage: 2009 S/W Version: 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2003Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

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    Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

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    Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified:Over 60 days ago