Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Process: High - K Type: Diffusion Air valve: FUJIKIN Heater: VCM-05-006L (000080470783) MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 400V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / O3 / Ar / TEMAH / N2 / OCTANE / TMA Others: KAWASAKI MECHAConfiguration
FORMULA 1S-H Process: High - K The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.Documents
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TEL / TOKYO ELECTRON
TELFORMULA
Verified
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72840
Wafer Sizes:
12"/300mm
Vintage:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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TEL / TOKYO ELECTRON
TELFORMULA
CATEGORY
Furnaces / Diffusion
Last Verified: Over 60 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
72840
Wafer Sizes:
12"/300mm
Vintage:
2005
Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
MISSING PARTS: (1 set) Quartz wares - process tube, etc. Software OS: TEL Waves Equipment status: Out of Fab Process: High - K Type: Diffusion Air valve: FUJIKIN Heater: VCM-05-006L (000080470783) MFC, MFM: HORIBA STEC Three phase power: 3Ø AC 400V Single phase power: 1Ø AC 208V Main/APC: CKD Gas: PN2 / O3 / Ar / TEMAH / N2 / OCTANE / TMA Others: KAWASAKI MECHAConfiguration
FORMULA 1S-H Process: High - K The furnace subsystem includes the following major components: - Automation system - Heater - Process chamber - Temperature controller - Scavenger - Cooling water unit The gas subsystem includes the following major components: - Gas supply unit - Exhaust - Vacuum line ( for LPCVD systems ) Power box ( consists of the primary power supply and the power control system ) Rapid cooling unit ( option for Fast Thermal Processing Systems ) Pump box ( option for LPCVD systems )OEM Model Description
TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.Documents
No documents