Skip to main content
6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
Moov logo

6" Fab For Sale from Moov - Click Here to Learn More
Moov Icon
TEL / TOKYO ELECTRON TELFORMULA
    Description
    Diffusion( Amorphous Anneal , ɑ-Si ) Manufacturer: TEL Model: FORMULA S/W Version 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78756


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / Diffusion
    Vintage: 2003Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/7ef9a9f94ddf477d90ca9e428b630dca_telformula_mw.png
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/288de7f8e393488e85924badec250ff9_telformula_mw.png
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/600dd3d5244a479da82fa63b9579a0e8_telformula_mw.jpg
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/71263e1f72cf418888596f1c3f45c05c_telformula_mw.jpg
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/893c9a150247459e9bf5952282037b28_telformula_mw.jpg
    listing-photo-bcba81b87635447bb105edcccfdac47b-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/bcba81b87635447bb105edcccfdac47b/4464daa025fb489dbd8ac84fe7fefd41_telformula_mw.jpg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78756


    Wafer Sizes:

    12"/300mm


    Vintage:

    2009


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Diffusion( Amorphous Anneal , ɑ-Si ) Manufacturer: TEL Model: FORMULA S/W Version 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2003Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified:Over 60 days ago