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TEL / TOKYO ELECTRON TELFORMULA
    Description
    Diffusion (NIT ) Manufacturer: TEL Model: FORMULA S/W Version 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon

    Verified

    CATEGORY
    Furnaces / Diffusion

    Last Verified: Over 60 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78758


    Wafer Sizes:

    12"/300mm


    Vintage:

    2007

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / Diffusion
    Vintage: 2003Condition: Used
    Last VerifiedOver 60 days ago

    TEL / TOKYO ELECTRON

    TELFORMULA

    verified-listing-icon
    Verified
    CATEGORY
    Furnaces / Diffusion
    Last Verified: Over 60 days ago
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/0cbbc87591af485b8980c68bb347d9d8_telformula_mw.png
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/f36f564e05414c499466c310c95f7a04_telformula_mw.png
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/134998369a8e47d6ad255c1f54e2ee8b_telformula_mw.jpg
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/1cbb9e9a83034f8f94c756e3fab3ea2a_telformula_mw.jpg
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/b4ee5a40d74d433cbbc1bb37bab37113_telformula_mw.jpg
    listing-photo-59246f62efb34e479dc38f085dbef069-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/73362/59246f62efb34e479dc38f085dbef069/bd2bbced09c841fc8abb5682b4662740_telformula_mw.jpg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    78758


    Wafer Sizes:

    12"/300mm


    Vintage:

    2007


    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    Diffusion (NIT ) Manufacturer: TEL Model: FORMULA S/W Version 2.0
    Configuration
    Please see attached configuration
    OEM Model Description
    TELFORMULA is an advanced thermal processing system designed for the production of 65 to 45-nm-node-generation devices and beyond. It offers a reasonable Cost of Ownership (CoO), a short cycle time, and significantly improved process performance. Some of its key features include an ultra-clean, all-quartz reactor, state-of-the-art heater element technology, high-speed wafer-transfer robotics, and in-situ dry gas cleaning technology. TELFORMULA has a wide range of applications, including radical oxidation (LPRO), ultra-thin gate dielectrics formation (oxidation, nitridation), LPCVD (supporting Poly, Sin, SiO2 / Dry gas cleaning), ultra-low temperature LPCVD, and high-k film formation (AIO, HfO, AIO / HfO, HfSiO). With its advanced technology and versatile capabilities, TELFORMULA is an optimal choice for thermal processing in the semiconductor industry.
    Documents
    Similar Listings
    View All
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2003Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2005Condition: UsedLast Verified:Over 60 days ago
    TEL / TOKYO ELECTRON TELFORMULA

    TEL / TOKYO ELECTRON

    TELFORMULA

    Furnaces / DiffusionVintage: 2007Condition: UsedLast Verified:Over 60 days ago