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MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
  • MATTSON / STEAG / AST 3000
Description
Some parts have been taken out.
Configuration
No Configuration
OEM Model Description
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.
Documents

No documents

CATEGORY
RTP/RTA

Last Verified: Over 60 days ago

Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

84895


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available

MATTSON / STEAG / AST

3000

verified-listing-icon
Verified
CATEGORY
RTP/RTA
Last Verified: Over 60 days ago
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Key Item Details

Condition:

Used


Operational Status:

Unknown


Product ID:

84895


Wafer Sizes:

Unknown


Vintage:

Unknown


Have Additional Questions?
Logistics Support
Available
Money Back Guarantee
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
Some parts have been taken out.
Configuration
No Configuration
OEM Model Description
The 3000 RTP system is the advanced generation RTP tool available with dual side heating to minimize pattern induced thermal non-uniformity and to achieve fast ramp rates of up to 250(degrees)C per second. The 3000 RTP system can be configured for both 200 mm and 300 mm wafers and its applications include ultra-shallow junction formation, implant annealing, cobalt silicide formation and oxinitride formation.
Documents

No documents