Description
AlCu & Ti sputter deposition cluster toolConfiguration
Platform: Brooks MX800 Process capability: AlCu / Ti (HIS-Modul) / degas / soft etch Peripherals: (Qty 2) Edwards L70 (Qty 2) Brooks CTI 9600 Upgraded from 6” to 8” in 2008 HIS-Module upgrade in 2021, incl. Artic chiller (-20 °C) I/O boards upgraded in 2021 Software upgraded in 2021 Turbo pumps replaced on loadlocks in 2021 Documentation available (incl. upgrade features) PM3: •DC sputtering source: ARQ151 •Currently running Aluminum-Copper Alloy (AlCu) DC-Sputter deposition process •300 mm target size •Operating at 8 kW process power •Process temperature: 270°C (Chuck Operating Temperature 300°C) PM4: •PVD sputtering source: ARQ151, upgraded for HiPIMS operation •Equipped with a 130 mm hub •Cold chuck with Arctic Chiller cooling system •Currently mounted with a 300 mm Titanium target for DC sputtering processOEM Model Description
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CATEGORY
PVD / Sputtering
Last Verified: 15 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154591
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
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EVATEC / UNAXIS / OERLIKON / BALZERS
CLUSTERLINE 200
CATEGORY
PVD / Sputtering
Last Verified: 15 days ago
Key Item Details
Condition:
Used
Operational Status:
Unknown
Product ID:
154591
Wafer Sizes:
8"/200mm
Vintage:
2001
Logistics Support
Available
Transaction Insured by Moov
Available
Refurbishment Services
Available
Description
AlCu & Ti sputter deposition cluster toolConfiguration
Platform: Brooks MX800 Process capability: AlCu / Ti (HIS-Modul) / degas / soft etch Peripherals: (Qty 2) Edwards L70 (Qty 2) Brooks CTI 9600 Upgraded from 6” to 8” in 2008 HIS-Module upgrade in 2021, incl. Artic chiller (-20 °C) I/O boards upgraded in 2021 Software upgraded in 2021 Turbo pumps replaced on loadlocks in 2021 Documentation available (incl. upgrade features) PM3: •DC sputtering source: ARQ151 •Currently running Aluminum-Copper Alloy (AlCu) DC-Sputter deposition process •300 mm target size •Operating at 8 kW process power •Process temperature: 270°C (Chuck Operating Temperature 300°C) PM4: •PVD sputtering source: ARQ151, upgraded for HiPIMS operation •Equipped with a 130 mm hub •Cold chuck with Arctic Chiller cooling system •Currently mounted with a 300 mm Titanium target for DC sputtering processOEM Model Description
None ProvidedDocuments
No documents