EVATEC / UNAXIS / OERLIKON / BALZERS CLUSTERLINE 200

Description

Last processed 6” wafer was Oct’21, currently the tool is not running with power-off condition.

Configuration

6" , can be upgraded to 8" 2 chambers SiO2 Clusterline machine that consist of 2x LL(LoadLock/Loading module) + TM(transfer module) + 1x Aligner(detect wafer flat) + 2x PM(process chamber) + 3x Degasser. The process chamber had run gases of O2, SF6, Ar, He, N2O, N2, NH3, SiH4, H2. Only process chamber was deposited with Silicon Nitride/Silicon Oxide