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PLASMATHERM LAPECVD
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: 8 days ago

    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    114751

    Wafer Sizes:

    Unknown

    Vintage:

    2006

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    Vintage: 2009Condition: Used
    Last VerifiedOver 60 days ago
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    Vintage: 2006Condition: Used
    Last Verified8 days ago

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: 8 days ago
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://d2pkkbyngq3xpw.cloudfront.net/moov_media/3.0-assets/photo-coming-soon-small.png
    Key Item Details
    Condition:

    Used

    Operational Status:

    Unknown

    Product ID:

    114751

    Wafer Sizes:

    Unknown

    Vintage:

    2006

    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    Similar Listings
    View All
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDVintage: 2009Condition: UsedLast Verified:Over 60 days ago
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDVintage: 2006Condition: UsedLast Verified:8 days ago