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6" Fab For Sale from Moov - Click Here to Learn More
6" Fab For Sale from Moov - Click Here to Learn More
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6" Fab For Sale from Moov - Click Here to Learn More
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PLASMATHERM LAPECVD
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    PLASMATHERM

    LAPECVD

    verified-listing-icon

    Verified

    CATEGORY
    PECVD

    Last Verified: 15 days ago

    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    114751


    Wafer Sizes:

    Unknown


    Vintage:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Similar Listings
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    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVD
    Vintage: 2009Condition: Used
    Last VerifiedOver 60 days ago

    PLASMATHERM

    LAPECVD

    verified-listing-icon
    Verified
    CATEGORY
    PECVD
    Last Verified: 15 days ago
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76241/7a6787c3d8ad406889461cc466aaf415/de11985e48884a288dc80de63ece79c8_c9a90fb97fcb4aa6bac469cc08821cc31201a_mw.jpeg
    listing-photo-7a6787c3d8ad406889461cc466aaf415-https://media-moov-co.s3.us-west-1.amazonaws.com/user_media/listingPhoto/76241/7a6787c3d8ad406889461cc466aaf415/f317b23b62fd4dc3840b2e287bd70098_44a119104d104acf9f0f7d1d485d27af1201a_mw.jpeg
    Key Item Details

    Condition:

    Used


    Operational Status:

    Unknown


    Product ID:

    114751


    Wafer Sizes:

    Unknown


    Vintage:

    2006


    Have Additional Questions?
    Logistics Support
    Available
    Money Back Guarantee
    Available
    Transaction Insured by Moov
    Available
    Refurbishment Services
    Available
    Description
    No description
    Configuration
    No Configuration
    OEM Model Description
    Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications. The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system. Hardware: -Cassette-to-Cassette Handling: - Multi-substrate batch processing -Dual cassettes -Platen heating up to 350°C -Upper electrode RF power at 13.56 MHz with optional MFD -Up to 8 gas channels with digital MFCs -Thermally managed reactor design—up to 175°C for internal walls and shower head
    Documents

    No documents

    Similar Listings
    View All
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDVintage: 2009Condition: UsedLast Verified:Over 60 days ago
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDVintage: 2006Condition: UsedLast Verified:15 days ago
    PLASMATHERM LAPECVD

    PLASMATHERM

    LAPECVD

    PECVDVintage: 0Condition: UsedLast Verified:2 days ago