Plasma-Therm is a global manufacturer of plasma etch, deposition, and advanced packaging equipment for the specialty semiconductor and nanotechnology markets.

Plasma-Therm’s LAPECVD™ (Large Area Plasma Enhanced Chemical Vapor Deposition) uses a cassette-to-cassette configuration to allow for high-volume production in a wide range of applications.

The LAPECVD™ platform can be used to deposit a variety of thin-film materials with its parallel-plate plasma deposition system.

Hardware:
-Cassette-to-Cassette Handling:
     - Multi-substrate batch processing
-Dual cassettes
-Platen heating up to 350°C
-Upper electrode RF power at 13.56 MHz with optional MFD
-Up to 8 gas channels with digital MFCs
-Thermally managed reactor design—up to 175°C for internal walls and shower head

PLASMA-THERM

LAPECVD

Plasma Enhanced Chemical Vapor Deposition System

PLASMA-THERM

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LAPECVD

Vision 310

SLR-730

VRL 700

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